1) Shown here is a photomask, which bears the patterns that will be printed onto a wafer.

2) In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.

3) The photomask auto-correction method can enhance the ability of automation in area-forming rapid prototyping system and reduce efficiently negative influence of human error.

4) E-beam tools are used in photomask writing,[http:///photomask.html] but many believe the technology will never be fast enough for high-volume semiconductor lithography.

5) So the measurement and control in the feature size of photomask can reduce the reject of IC and research on this area is very meaningful.

6) A real-time white light information processing System using spatial filtering for IC photomask inspection is described.

7) In the manufacture process of integrated circuit(IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.

8) The flow boards with micro channels were fabricated by photomask alignment and exposure system associated with photoresist coating technique.

9) Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.

10) In this paper, The technology guideline and the technology difficulty for next generation photomask processes are discussed, and some pivotal technology resolving projects are also ...

11) With the narrow of geometric graphics of IC, it put higher requirements in the manufacturing quality of photomask.

12) The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made.

13) Experimenting repeatedly, by our limited equipments we provided the qualified photomask for the study of 3DG460 microwave low-noise transistor.

14) In this paper, micro vision was used to make measurements on the feature size of photomask.

15) This paper describes the maskless wiring formation technology not using photomask and photoresist, development of metal nano particle and nano ink, application of the inkjet method and future theme.